Effect of Ion Energy on the Microstructure and Properties of Titanium Nitride Thin Films Deposited by High Power Pulsed Magnetron Sputtering

نویسندگان

چکیده

Titanium nitride (Ti-N) thin films are electrically and thermally conductive have high hardness corrosion resistance. Dense defect-free Ti-N been widely used in the surface modification of cutting tools, wear resistance components, medical implantation devices, microelectronics. In this study, were deposited by power pulsed magnetron sputtering (HPPMS) their plasma characteristics analyzed. The ion energy Ti species was varied adjusting substrate bias voltage, its effect on microstructure, residual stress, adhesion studied. results show that after introduction nitrogen gas, a compound layer formed target, which resulted an increase target discharge peak power. addition, total flux decreased, ratio ions increased. film HPPMS dense defect-free. When increased, grain size roughness stress strength decreased.

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ژورنال

عنوان ژورنال: Coatings

سال: 2021

ISSN: ['2079-6412']

DOI: https://doi.org/10.3390/coatings11050579